Top quality
Fast delivery and really good products. I always enjoy coming back.
Fix Base is an advanced version of Rubber Base with an optimized formula. It is similar to a Rubber Base but has a thinner viscosity.
Properties:
Application:
!ATTENTION!:
For professional use only. Avoid skin contact. Avoid eye contact. Please read the instructions carefully before use. In case of an allergic reaction, discontinue use immediately. Keep out of reach of children.
The UV nail polish should be protected from natural sunlight, otherwise, the product may cure.
We would like to point out that the colours shown in the product card images may differ slightly from the actual colours of the products. The reason for the aforementioned differences lies in the individual settings of your computer monitor.
Please note that for hygienic reasons, returns of UV nail polishes, gels, and liquids are excluded.
Manufacturer according to GPSR: Tiwatiwacom Sia, Dzervju iela 6, Riga, LV-1019, Latvia EMAIL: lunamoongel.eu@gmail.com
100% secure payment – your data is safe with us.
Fix Base is an advanced version of Rubber Base with an optimized formula. It is similar to a Rubber Base but has a thinner viscosity.
Properties:
Application:
!ATTENTION!:
For professional use only. Avoid skin contact. Avoid eye contact. Please read the instructions carefully before use. In case of an allergic reaction, discontinue use immediately. Keep out of reach of children.
The UV nail polish should be protected from natural sunlight, otherwise, the product may cure.
We would like to point out that the colours shown in the product card images may differ slightly from the actual colours of the products. The reason for the aforementioned differences lies in the individual settings of your computer monitor.
Please note that for hygienic reasons, returns of UV nail polishes, gels, and liquids are excluded.
Manufacturer according to GPSR: Tiwatiwacom Sia, Dzervju iela 6, Riga, LV-1019, Latvia EMAIL: lunamoongel.eu@gmail.com
100% secure payment – your data is safe with us.